An amorphous-to-crystalline phase transition within thin silicon films grown by ultra-high-vacuum evaporation and its impact on the optical response

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DOIResolve DOI: http://doi.org/10.1063/1.4941021
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TypeArticle
Journal titleJournal of Applied Physics
ISSN0021-8979
Volume119
Issue6
Article number65702
SubjectAbsorption spectroscopy; Amorphous films; Crystalline materials; Electromagnetic wave absorption; Evaporation; Growth temperature; Light absorption; Metallic films; Optical films; Quartz; Silicon; Substrates; Ultrahigh vacuum; Vacuum evaporation; Volume fraction; X ray diffraction; Crystalline phase transition; Crystalline silicon substrates; Crystalline volume fraction; Decomposition process; Grazing incidence X-ray diffraction; Optical absorption coefficients; Spectral dependences; Wave-vector conservation
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PublisherAIP Publishing
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); Measurement Science and Standards
Peer reviewedYes
NPARC number21277448
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Record identifiercf1e149d-8dcb-4b3d-966e-26c6ea98a89f
Record created2016-03-09
Record modified2016-05-09
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