5 years of ambient pressure photoelectron spectroscopy (APPES) at the Swiss Light Source (SLS)

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DOIResolve DOI: http://doi.org/10.1016/j.elspec.2017.01.003
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TypeArticle
Journal titleJournal of Electron Spectroscopy and Related Phenomena
ISSN0368-2048
Volume216
Pages116
SubjectX-ray photoelectron spectroscopy (XPS); near edge X-ray absorption fine structure (NEXAFS); liquid microjet; in situ spectroscopy; electrical double layer; surface potential
Abstract
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PublisherElsevier
LanguageEnglish
AffiliationMeasurement Science and Standards; National Research Council Canada
Peer reviewedYes
NPARC number23002556
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Record identifier742f3a3d-3629-4ed3-9bdd-f25d3cae5b86
Record created2017-11-30
Record modified2017-11-30
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