New fabrication technique for highly sensitive qPlus sensor with well-defined spring constant

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DOIResolve DOI: http://doi.org/10.1016/j.ultramic.2015.06.008
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TypeArticle
Journal titleUltramicroscopy
ISSN0304-3991
Volume158
Pages3337; # of pages: 5
SubjectChemical sensors; Focused ion beams; Image reconstruction; Quartz; Scanning probe microscopy; Springs (components); AFM; Atomic-resolution imaging; Fabrication technique; Field evaporation; High resonance frequency; Quartz tuning fork; Spring constants; Atomic force microscopy; silicon dioxide; tungsten; atomic force microscopy; electric conductivity; electric field; electrochemistry; evaporation; measurement accuracy; nanotechnology; qPlus sensor; quantitative analysis; sensitivity analysis; sensor; surface property
Abstract
Publication date
PublisherElsevier
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); National Institute for Nanotechnology; Security and Disruptive Technologies
Peer reviewedYes
NPARC number21276995
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Record identifier409ecae4-a348-4073-9622-1996a567b2ad
Record created2015-11-10
Record modified2016-05-09
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