Nanoscale plasmonic stamp lithography on silicon

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DOIResolve DOI: http://doi.org/10.1021/acsnano.5b00312
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TypeArticle
Journal titleACS Nano
ISSN1936-0851
Volume9
Issue2
Pages21842193; # of pages: 10
SubjectBlock copolymers; Copolymers; Electric fields; Films; Functional materials; Gold; Hydrosilylation; Lithography; Nanolithography; Nanotechnology; Semiconducting silicon; Semiconductor device manufacture; Silicon; Surface plasmon resonance; Block copolymer self-assembly; Directed self-assembly; Electron hole pairs; Functionalizations; Localized surface plasmon; Nano pattern; Nanoscale lithography; Semiconductor industry; Plasmons
Abstract
Publication date
PublisherACS Publications
LanguageEnglish
AffiliationNational Research Council Canada (NRC-CNRC); National Institute for Nanotechnology
Peer reviewedYes
NPARC number21275801
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Record identifier4036d732-6acd-437a-a79c-ea18086002db
Record created2015-07-14
Record modified2016-05-09
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