Auteur | Rechercher : Cai, Feng; Rechercher : Yang, Qi1; Rechercher : Huang, Xiao |
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Affiliation | - Conseil national de recherches du Canada. Institut de recherche aérospatiale du CNRC
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Format | Texte, Article |
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Conférence | TMS 2012: 141st Annual Meeting and Exhibition, March 11-15, 2012, Orlando, FL, USA |
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Sujet | PVD coating, coating defect, corrosion, electrochemical impedance, EIS |
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Résumé | Applying noble coatings on steel components is an effective solution to preventing corrosion attacks. However, through-coating defects, such as pin holes, voids and growth defects play a detrimental role in the degradation of a coating-substrate system. Through the defects, corrosive media are able to reach the metal substrate, initializing pitting corrosion and eventually resulting in coating failure. This research studies the correlation between coating defects and corrosion behavior of the TiN and CrN (CrSiCN) coated mild steel and stainless steel. Electrochemical impedance technique is used to reveal the corrosion behavior. The results revealed that in a coating-substrate system, two critical factors controlling the corrosion resistance, the effective diffusion coefficient and diffusion layer thickness, which are found to be related to coating microstructure. Denser and thicker coating structures result in lower effective diffusion coefficients and greater effective diffusion layer thickness, and demonstrate high electrochemical impedance and resistance to electrochemical corrosion. |
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Date de publication | 2012 |
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Dans | |
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Langue | anglais |
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Publications évaluées par des pairs | Oui |
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Numéro NPARC | 21270207 |
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Exporter la notice | Exporter en format RIS |
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Signaler une correction | Signaler une correction (s'ouvre dans un nouvel onglet) |
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Identificateur de l’enregistrement | c78a985d-14c3-4652-a634-72413f07173e |
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Enregistrement créé | 2014-01-10 |
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Enregistrement modifié | 2020-04-21 |
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