| Résumé | A technique, based on quantum well (QW) intermixing, has been developed for the post growth, spatially selective tuning of the QW bandgap in a laser structure. High energy (MeV) ion implantation is used to create a large number of vacancies and interstitials in the device. During high temperature processing, these defects simultaneously enhance the intermixing of the QW and the barrier materials, producing a blue shift of the QW bandgap, and are annealed out. Increases in bandgap energy (measured using low temperature photoluminescence spectroscopy) of greater than 60 meV can be achieved. Absorption spectroscopy in the waveguide direction is also used to quantify any excess loss in the structure. Using a simple masking scheme to spatially modify the defect concentration, different regions of a wafer can be blue shifted by different amounts. This allows the integration of many different devices such as lasers, detectors, modulators, waveguides etc. on a single wafer using only a single, post-growth processing step. The performance of both passive (waveguide) and active (laser) devices produced using this technique is described, as well as the practicality of this technique in the production of photonic integrated circuits. |
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