Elastic strain determination in semiconductor epitaxial layers by HREM

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1016/0968-4328(95)00020-8
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Affiliation
  1. National Research Council of Canada. NRC Institute for Fuel Cell Innovation
  2. National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
FormatText, Article
Conference22nd annual meeting of the Microscopical Society of Canada
Subjectcumulative sum; Fourier filtering; high resolution electron microscopy; image simulations; lattice fringes; semiconductor bilayer; semiconductor superlattice; strain analysis; surface relaxation; surface roughnes
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NPARC number12339239
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Record identifierf85cf2ab-8132-4c8f-8afd-8d6879c2cd31
Record created2009-09-11
Record modified2020-04-29
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