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Lateral diffusion of titanium disilicide as a route to contacting hybrid Si/organic nanostructures

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1063/1.1519959
AuthorSearch for: ; Search for: 1; Search for: 1; Search for: 2
Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
  2. National Research Council of Canada. NRC Steacie Institute for Molecular Sciences
FormatText, Article
SubjectATOMIC FORCE MICROSCOPY; NANOSTRUCTURES (DEVICES); NANOTECHNOLOGY; SCANNING TUNNELING MICROSCOPY; SEMICONDUCTORS (MATERIALS); SOLID-SOLID INTERFACES; SURFACE DIFFUSION; TITANIUM COMPOUNDS; TRANSPORT PROPERTIES
Abstract
We characterized microscopic patterns of TiSi2 using atomic force microscopy and scanning tunneling microscopy, to test the possibility of using silicide contacts for experiments on the nanoscopic scale. We observed the effect on the morphology of incomplete formation of the disilicide, and studied the growth of lateral extension due to atomic diffusion. Upon diffusion, the silicide forms a neat and clean interface some hundreds of nanometers from the bulk electrode. That spreading phenomenon is our central focus, as we believe it may be useful in future efforts to make narrowly spaced contacts.
Publication date
In
  • Applied Physics Letters 81, no. 19 (November 2002): 3636–3638.
LanguageEnglish
NPARC number12336490
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Record identifierecad768d-9f68-4fed-8612-4f6075c8f762
Record created2009-09-10
Record modified2020-04-06
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