DOI | Resolve DOI: https://doi.org/10.1364/OL.20.001450 |
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Author | Search for: Montcalm, Claude1; Search for: Sullivan, Brian T.1; Search for: Duguay, Sophie1; Search for: Ranger, M.1; Search for: Steffens, W.1; Search for: Pépin, Henri; Search for: Chaker, M. |
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Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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Format | Text, Article |
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Abstract | With a new ultrahigh-vacuum deposition/ref lectometer system, Mo/Y multilayer mirrors were deposited by dc-magnetron sputtering and characterized in situ with synchrotron radiation. The Mo/Y multilayer mirrors, measured before exposure to air, had near-normal-incidence reflectances as high as 46% at wavelengths near 11.4 nm. After several days of exposure these samples typically had a relative reflectance loss of ~10% as a result of oxidation of the top Mo layer. The best Mo/Y multilayers were fabricated with base pressures below the low 10-9 Torr range and after a bakeout to reduce water vapor in the chamber. |
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Publication date | 1995-06-15 |
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In | |
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NPARC number | 12327606 |
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Export citation | Export as RIS |
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Record identifier | db41f240-b509-4f74-9d85-1c892f7ab8f9 |
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Record created | 2009-09-10 |
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Record modified | 2020-04-29 |
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