| DOI | Resolve DOI: https://doi.org/10.1016/j.tsf.2011.01.241 |
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| Author | Search for: LaForge, Joshua M.; Search for: Taschuk, Michael T.; Search for: Brett, Michael J.1 |
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| Affiliation | - National Research Council of Canada. National Institute for Nanotechnology
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| Format | Text, Article |
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| Subject | Zinc oxide; Crystal; Sputtering; Nanostructure; Thin film; Morphology; Kinetics; Nanorod |
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| Abstract | Zinc oxide nanorod films produced by glancing angle deposition were fabricated within the parameter space defined by the process variables pitch (nanorod growth per substrate rotation), deposition rate, and throw distance to investigate the effect these parameters have on morphology and crystallinity. Statistical analysis was used to identify important relationships. Final film morphology depends on both pitch and deposition rate, where two growth regimes distinguished by deposition rate are observed and interpreted as arising from competition between geometric shadowing and crystalline growth kinetics. Optimal growth conditions for nanostructured films of isolated zinc oxide nanorods occurred for pitch values of approximately 1 nm to 10 nm. Pole-figure measurements confirm that the films consist of oriented single-crystal nanorods. Films deposited at all pitch values between 0.001 nm to 6.5 μm are crystalline and textured, and greater texturing is achieved for conditions of decreased surface diffusion. © 2011 Elsevier B.V. All rights reserved. |
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| Publication date | 2011-01-28 |
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| In | |
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| Language | English |
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| Peer reviewed | Yes |
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| NPARC number | 21271961 |
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| Export citation | Export as RIS |
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| Report a correction | Report a correction (opens in a new tab) |
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| Record identifier | ba410d5e-155f-414d-9153-d1151d9937cc |
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| Record created | 2014-05-13 |
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| Record modified | 2020-04-21 |
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