Growth of SiO2 at the Sc2O3/Si100 interface during annealing

From National Research Council Canada

Alternative titleSilicon Nitride and Silicon Dioxide Thin Films VII
AuthorSearch for: ; Search for: ; Search for: 1; Search for: ; Search for: ; Search for: ; Search for:
Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
ConferenceSpring ECS Meeting, March 23-April 1, 2003, Paris, France
NPARC number12346215
Export citationExport as RIS
Report a correctionReport a correction (opens in a new tab)
Record identifier9dcca308-697d-453c-afdd-1f78b51a0bef
Record created2009-09-17
Record modified2020-04-16
Date modified: