Low temperature plasma etching for Si3N4 waveguide applications

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1116/1.2836424
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  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
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NPARC number12744647
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Record identifier800aa0a3-663d-4393-af30-2aabd23dcfa8
Record created2009-10-27
Record modified2020-04-15
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