Using self-assembled block copolymer templates to mediate nanoscale patterning on technologically relevant semiconductor surfaces
Using self-assembled block copolymer templates to mediate nanoscale patterning on technologically relevant semiconductor surfaces
Format | Text, Other |
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Publication date | 2006 |
In | |
NRC number | NRC-NINT-188 |
NPARC number | 8926546 |
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Record identifier | 5d0d1298-b6ac-49ef-8672-81e511f405cf |
Record created | 2009-04-23 |
Record modified | 2020-09-25 |
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