DOI | Resolve DOI: https://doi.org/10.1109/ICO-IP.2011.5953789 |
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Author | Search for: Alonso-Ramos, C.; Search for: Ortega-Monux, A.; Search for: Molina-Fernandez, I.; Search for: Cheben, P.1ORCID identifier: https://orcid.org/0000-0003-4232-9130; Search for: Zavargo-Peche, L.; Search for: Halir, R.; Search for: Kim, N.1; Search for: Janz, S.1; Search for: Xu, D.-X.1 |
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Affiliation | - National Research Council of Canada. NRC Institute for Microstructural Sciences
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Format | Text, Article |
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Conference | 2011 ICO International Conference on Information Photonics, IP 2011, 18 May 2011 through 20 May 2011, Ottawa, ON |
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Subject | chip coupling; coupling efficiency; grating couplers; higher-order modes; I-line steppers; optimized designs; rib waveguides; Si wire waveguide; silicon layer; single etch; thick SOI; wafer scale; optimization; photonics; silicon wafers; waveguides |
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Abstract | The use of grating couplers for fiber to chip coupling is a promising technique, allowing wafer scale testing with no need for facet preparation. Albeit grating couplers have been extensively studied for Si-wire waveguides, the implementation on SOI micrometric rib waveguides remains challenging, mainly due to excitation of higher order modes. In this work we show for the first time that monomode excitation of the grating can be achieved by properly designing the access waveguide. With the proposed approach the circuit can be fabricated using standard i-line stepper litography with a single etch step. The optimized design for a 1.5m thick silicon layer achieves a simulated coupling efficiency of 65.6% at 1.55m. Preliminary experimental results yield a coupler loss of 4dB. © 2011 IEEE. |
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Publication date | 2011 |
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In | |
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Language | English |
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Peer reviewed | Yes |
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NPARC number | 21271481 |
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Export citation | Export as RIS |
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Report a correction | Report a correction (opens in a new tab) |
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Record identifier | 532e168c-efc6-49e5-8c31-035008236f64 |
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Record created | 2014-03-24 |
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Record modified | 2020-04-21 |
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