Growth and characterization of anodic oxides on Si(100) formed in 0.1 M hydrochloric acid

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1063/1.362502
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  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
Subjectelectrolytes; ellipsometry; film growth; oxidation; photoelectron spectroscopy; silicon; silicon oxides; xrd
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LanguageEnglish
NPARC number12327992
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Record identifier4ff86f5c-457b-44e4-86ad-d4e7423005ce
Record created2009-09-10
Record modified2020-03-20
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