Study of the interaction of polymethylmethacrylate fragments with methyl isobutyl ketone and isopropyl alcohol

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Journal titleJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Article number06FF11
SubjectDevelopment process; Dissolution behavior; Exposure sensitivity; Flory-Huggins theory; Fragment sizes; Gyration radii; Interaction mechanisms; Isopropyl alcohols; Kinetic factors; Materials Studio; Methyl isobutyl ketone; Molecular dynamics simulations; Molecular scale; Polymer fragments; Electron beam lithography; Ketones; Molecular dynamics; Organic compounds; Polyesters; Polymers; Acrylic monomers
AbstractExposure of polymethylmethacrylate (PMMA) during electron beam lithography (EBL) produces small polymer fragments that dissolve rapidly during the development process. The resist dissolution behavior varies greatly depending on the nature of the developer (solvent) and therefore influences the selection of the EBL parameters, such as dose (sensitivity). A molecular scale examination of the development process is necessary to elucidate the resist-developer interaction mechanisms. In this work, the authors investigate the interaction of short PMMA chains (containing up to 10 MMA units) with common developer components methyl isobutyl ketone (MIBK) and isopropyl alcohol (IPA). For this purpose, the authors conduct molecular dynamics simulations using the Accelrys Materials Studio package. The simulation results were used to characterize the mixtures in the spirit of the Flory-Huggins theory of polymers and also to extract the diffusivities. The authors found that the behavior of PMMA fragments differed considerably in MIBK as compared with IPA. PMMA fragments containing more than three monomers exhibit stronger attractive interaction with MIBK. For all fragment sizes simulated, the diffusivity of PMMA fragments is 60-160 higher in MIBK as well. Similarly, the authors observed differences in the gyration radii. The authors conclude that the kinetic factor seems to be more significant as compared to affinity factor when accounting for differences in exposure sensitivities due to developer selection.
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AffiliationNational Research Council Canada (NRC-CNRC); Security and Disruptive Technologies
Peer reviewedYes
NPARC number21270233
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Record identifier28580cff-41ef-44e8-bcbd-69dfa9684891
Record created2014-01-14
Record modified2016-05-09
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