Properties of InAlP Native Oxides Suorting MOS Inversion-layer Behavior

From National Research Council Canada

AuthorSearch for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for: ; Search for:
FormatText, Article
Conference43rd Electronic Materials Conference, June 27-29 2001, Notre Dame, Indiana
NPARC number12346233
Export citationExport as RIS
Report a correctionReport a correction (opens in a new tab)
Record identifier280608c4-8784-4d59-930a-f5c74ec9b2d4
Record created2009-09-17
Record modified2020-04-16
Date modified: