Fabrication and characterisation of multi-level lateral nano-devices

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1016/0039-6028(94)90971-7
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Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
SubjectElectron transitions; Gates (transistor); Semiconducting aluminum compounds; Semiconducting gallium arsenide; Semiconductor device structures; Semiconductor quantum wells; Surfaces; Artificial impurity; Multilevel lateral nano-devices; Quantum dot; Quantum interference effects; Ring geometry; Semiconducting aluminum gallium arsenide; Surface gate patterns; Semiconductor device manufacture
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LanguageEnglish
Peer reviewedYes
NPARC number21274634
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Record identifier1af138e6-6c21-4920-9cd5-05e5a0adcd1f
Record created2015-03-18
Record modified2020-04-27
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