Fabrication of metal nanowires by ion-beam irradiation of oxides through high aspect ratio resist masks

From National Research Council Canada

DOIResolve DOI: https://doi.org/10.1116/1.3548875
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Affiliation
  1. National Research Council of Canada. NRC Institute for Microstructural Sciences
FormatText, Article
SubjectBismuth nanowires; Bismuth oxides; Contact pads; Dielectric matrixes; e-Beam lithography; Electrical property; Electron beam resist; High aspect ratio; Ion beam irradiation; matrix; Metal film; Metal nanowire; Metal oxides; Metal wires; Oxygen atom; Parallel nanowires; Selective removal; Single layer; Zeon Chemicals; Aspect ratio; Bismuth; Electric properties; Electric wire; Electron beam lithography; Fabrication; Ion beams; Irradiation; Metallic compounds; Nanowires; Oxygen; Protons; Metals
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LanguageEnglish
Peer reviewedYes
NPARC number21271139
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Record identifier15d34570-d6ff-4ef7-a634-442c1998b80a
Record created2014-03-24
Record modified2020-04-21
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