Large-area pulsed laser deposition of silicon carbide films

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Series titleMRS Proceedings; no. 715
Conference2002 Materials Research Society Spring Meeting, April 1-5 2002, San Francisco California
AbstractSilicon carbide (SiC) thin films are attractive for a wide range of applications ranging from microelectronic and opto-electronic devices to protective and tribological coatings. In this paper, we will demonstrate that silicon carbide films can be successfully deposited by pulsed laser deposition (PLD) technique over large areas, with good uniformity in thickness, composition, and film-specific properties.
PublisherMaterials Research Society
AffiliationNRC Industrial Materials Institute; National Research Council Canada
Peer reviewedYes
NPARC number21272974
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Record identifier11e487f6-58c6-449f-bb06-6cee63fd8981
Record created2014-12-03
Record modified2016-05-09
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